Publication detail
Optical and fractal properties of sputter deposited TiO2 films
SHAKOURY, R. NAHVIFARD, E. ARMAN, A. ASTINCHAP, B. JUREČKA, S. MARDANI, M. AMRAEE-RAD, G. MIRZAEI, S.
Original Title
Optical and fractal properties of sputter deposited TiO2 films
Type
journal article in Web of Science
Language
English
Original Abstract
In this study, TiO2 films were deposited on the glass substrates at different pressures using a DC magnetron sputtering system. The surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy in non-contact mode and spectrophotometer (UV-visible) analysis. The Gwyddion open source software was used to analyze the AFM results. The surface morphology, absorption spectra, transparency, and energy band gap of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8 x 10(-3) Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc's method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of similar to 4 eV, probably due to their small grain size.
Keywords
TiO2; Magnetron sputtering; Optical properties; AFM; Fractal analysis
Authors
SHAKOURY, R.; NAHVIFARD, E.; ARMAN, A.; ASTINCHAP, B.; JUREČKA, S.; MARDANI, M.; AMRAEE-RAD, G.; MIRZAEI, S.
Released
1. 2. 2023
Publisher
SPRINGER
Location
DORDRECHT
ISBN
1572-817X
Periodical
Optical and Quantum Electronics
Year of study
55
Number
2
State
Kingdom of the Netherlands
Pages count
15
URL
BibTex
@article{BUT184006,
author="Reza {Shakoury} and Eleheh {Nahvifard} and Ali {Arman} and Bandar {Astinchap} and Stanislav {Jurečka} and Mohsen {Mardani} and Ghasem {Amraee-Rad} and Saeed {Mirzaei}",
title="Optical and fractal properties of sputter deposited TiO2 films",
journal="Optical and Quantum Electronics",
year="2023",
volume="55",
number="2",
pages="15",
doi="10.1007/s11082-022-04295-2",
issn="1572-817X",
url="https://link.springer.com/article/10.1007/s11082-022-04295-2"
}