Detail publikace
Optical and fractal properties of sputter deposited TiO2 films
SHAKOURY, R. NAHVIFARD, E. ARMAN, A. ASTINCHAP, B. JUREČKA, S. MARDANI, M. AMRAEE-RAD, G. MIRZAEI, S.
Originální název
Optical and fractal properties of sputter deposited TiO2 films
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
In this study, TiO2 films were deposited on the glass substrates at different pressures using a DC magnetron sputtering system. The surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy in non-contact mode and spectrophotometer (UV-visible) analysis. The Gwyddion open source software was used to analyze the AFM results. The surface morphology, absorption spectra, transparency, and energy band gap of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8 x 10(-3) Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc's method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of similar to 4 eV, probably due to their small grain size.
Klíčová slova
TiO2; Magnetron sputtering; Optical properties; AFM; Fractal analysis
Autoři
SHAKOURY, R.; NAHVIFARD, E.; ARMAN, A.; ASTINCHAP, B.; JUREČKA, S.; MARDANI, M.; AMRAEE-RAD, G.; MIRZAEI, S.
Vydáno
1. 2. 2023
Nakladatel
SPRINGER
Místo
DORDRECHT
ISSN
1572-817X
Periodikum
Optical and Quantum Electronics
Ročník
55
Číslo
2
Stát
Nizozemsko
Strany počet
15
URL
BibTex
@article{BUT184006,
author="Reza {Shakoury} and Eleheh {Nahvifard} and Ali {Arman} and Bandar {Astinchap} and Stanislav {Jurečka} and Mohsen {Mardani} and Ghasem {Amraee-Rad} and Saeed {Mirzaei}",
title="Optical and fractal properties of sputter deposited TiO2 films",
journal="Optical and Quantum Electronics",
year="2023",
volume="55",
number="2",
pages="15",
doi="10.1007/s11082-022-04295-2",
issn="1572-817X",
url="https://link.springer.com/article/10.1007/s11082-022-04295-2"
}