Publication result detail
Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films
RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.
Original Title
Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films
English Title
Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.
English abstract
The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.
Keywords
Plasma deposition, organosilicone layers, optical emission spectroscopy
Key words in English
Plasma deposition, organosilicone layers, optical emission spectroscopy
Authors
RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.
Released
01.09.2003
Publisher
Sloveská Akadémia Ved
Location
Bratislava
ISBN
0323-0465
Periodical
Acta Physica Slovaca
Volume
53
Number
5
State
Slovak Republic
Pages from
401
Pages count
5
BibTex
@article{BUT41506,
author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
title="Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films",
journal="Acta Physica Slovaca",
year="2003",
volume="53",
number="5",
pages="5",
issn="0323-0465"
}