Publication result detail
Burning conditions of nonthermal Ar plasma at continuous and pulsed mode
PŘIKRYL, R.; STUDÝNKA, J.; ČECH, V.
Original Title
Burning conditions of nonthermal Ar plasma at continuous and pulsed mode
English Title
Burning conditions of nonthermal Ar plasma at continuous and pulsed mode
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
A new capacitively coupling system has been developed for the plasma treatment and coating of planar substrates. The system with a bottom rotary electrode and an up- per grounded shower type electrode can be evacuated to the basic vacuum of 10-6 Pa using a turbomolecular pump. A side load lock can be used to feed the bottom electrode by six substrates double-side polished silicon wafer 10x10x0.6mm3) using a magnetic drive. The reactor was equipped by an RF power supply of 1 000W (13.56 MHz) operated in continuous and pulsed mode. The distance between both the electrodes can be posi- tioned from 20mm to 60 mm. Discharge conditions of Ar plasma have been determined with respect to the argon Flow-rate (2 - 50 sccm), pressure (0:5 - 50Pa) and RF power of continuous (1 - 300W) and pulsed (0:1 - 300W) mode for two distances of the elec- trodes (30 and 60 mm). Processing chart pressure vs. power has been constructed in order to found out conditions for stable Ar{plasma. The stability of glow discharge was observed by phototransistor, sensitive in the range 300 - 850 nm. The self-bias of the bottom elec- trode was monitored as a function of the RF power, flow-rate and pressure as well.
English abstract
A new capacitively coupling system has been developed for the plasma treatment and coating of planar substrates. The system with a bottom rotary electrode and an up- per grounded shower type electrode can be evacuated to the basic vacuum of 10-6 Pa using a turbomolecular pump. A side load lock can be used to feed the bottom electrode by six substrates double-side polished silicon wafer 10x10x0.6mm3) using a magnetic drive. The reactor was equipped by an RF power supply of 1 000W (13.56 MHz) operated in continuous and pulsed mode. The distance between both the electrodes can be posi- tioned from 20mm to 60 mm. Discharge conditions of Ar plasma have been determined with respect to the argon Flow-rate (2 - 50 sccm), pressure (0:5 - 50Pa) and RF power of continuous (1 - 300W) and pulsed (0:1 - 300W) mode for two distances of the elec- trodes (30 and 60 mm). Processing chart pressure vs. power has been constructed in order to found out conditions for stable Ar{plasma. The stability of glow discharge was observed by phototransistor, sensitive in the range 300 - 850 nm. The self-bias of the bottom elec- trode was monitored as a function of the RF power, flow-rate and pressure as well.
Keywords
argon palsma, PECVD technology
Key words in English
argon palsma, PECVD technology
Authors
PŘIKRYL, R.; STUDÝNKA, J.; ČECH, V.
Released
26.06.2006
Publisher
Institute of Physics.. Academy of Sciences of the Czech Republic
Location
Praha CR
ISBN
0011-4626
Periodical
Czechoslovak Journal of Physics
Volume
56
Number
B
State
Czech Republic
Pages from
1320
Pages to
1325
Pages count
6
BibTex
@article{BUT43252,
author="Radek {Přikryl} and Jan {Studýnka} and Vladimír {Čech}",
title="Burning conditions of nonthermal Ar plasma at continuous and pulsed mode",
journal="Czechoslovak Journal of Physics",
year="2006",
volume="56",
number="B",
pages="1320--1325",
issn="0011-4626"
}