R&D result detail

Original Title

Burning conditions of nonthermal Ar plasma at continuous and pulsed mode

English Title

Burning conditions of nonthermal Ar plasma at continuous and pulsed mode

Type

Peer-reviewed article not indexed in WoS or Scopus

Original Abstract

A new capacitively coupling system has been developed for the plasma treatment and coating of planar substrates. The system with a bottom rotary electrode and an up- per grounded shower type electrode can be evacuated to the basic vacuum of 10-6 Pa using a turbomolecular pump. A side load lock can be used to feed the bottom electrode by six substrates double-side polished silicon wafer 10x10x0.6mm3) using a magnetic drive. The reactor was equipped by an RF power supply of 1 000W (13.56 MHz) operated in continuous and pulsed mode. The distance between both the electrodes can be posi- tioned from 20mm to 60 mm. Discharge conditions of Ar plasma have been determined with respect to the argon Flow-rate (2 - 50 sccm), pressure (0:5 - 50Pa) and RF power of continuous (1 - 300W) and pulsed (0:1 - 300W) mode for two distances of the elec- trodes (30 and 60 mm). Processing chart pressure vs. power has been constructed in order to found out conditions for stable Ar{plasma. The stability of glow discharge was observed by phototransistor, sensitive in the range 300 - 850 nm. The self-bias of the bottom elec- trode was monitored as a function of the RF power, flow-rate and pressure as well.

English abstract

A new capacitively coupling system has been developed for the plasma treatment and coating of planar substrates. The system with a bottom rotary electrode and an up- per grounded shower type electrode can be evacuated to the basic vacuum of 10-6 Pa using a turbomolecular pump. A side load lock can be used to feed the bottom electrode by six substrates double-side polished silicon wafer 10x10x0.6mm3) using a magnetic drive. The reactor was equipped by an RF power supply of 1 000W (13.56 MHz) operated in continuous and pulsed mode. The distance between both the electrodes can be posi- tioned from 20mm to 60 mm. Discharge conditions of Ar plasma have been determined with respect to the argon Flow-rate (2 - 50 sccm), pressure (0:5 - 50Pa) and RF power of continuous (1 - 300W) and pulsed (0:1 - 300W) mode for two distances of the elec- trodes (30 and 60 mm). Processing chart pressure vs. power has been constructed in order to found out conditions for stable Ar{plasma. The stability of glow discharge was observed by phototransistor, sensitive in the range 300 - 850 nm. The self-bias of the bottom elec- trode was monitored as a function of the RF power, flow-rate and pressure as well.

Keywords

argon palsma, PECVD technology

Key words in English

argon palsma, PECVD technology

Authors

PŘIKRYL, R.; STUDÝNKA, J.; ČECH, V.

Released

26.06.2006

Publisher

Institute of Physics.. Academy of Sciences of the Czech Republic

Location

Praha CR

ISBN

0011-4626

Periodical

Czechoslovak Journal of Physics

Volume

56

Number

B

State

Czech Republic

Pages from

1320

Pages to

1325

Pages count

6

BibTex

@article{BUT43252,
  author="Radek {Přikryl} and Jan {Studýnka} and Vladimír {Čech}",
  title="Burning conditions of nonthermal Ar plasma at continuous and pulsed mode",
  journal="Czechoslovak Journal of Physics",
  year="2006",
  volume="56",
  number="B",
  pages="1320--1325",
  issn="0011-4626"
}