Detail publikačního výsledku

Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

INAGAKI, N.; ČECH, V.

Original Title

Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

English Title

Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

Type

Peer-reviewed article not indexed in WoS or Scopus

Original Abstract

SiOx films were deposited from a mixture of tetramethoxysilane (TMOS) and oxygen on poly(ethylene 2,6-naphtalene) film using ion-assisted plasma polymerization technique and conventional plasma polymerization technique.

English abstract

SiOx films were deposited from a mixture of tetramethoxysilane (TMOS) and oxygen on poly(ethylene 2,6-naphtalene) film using ion-assisted plasma polymerization technique and conventional plasma polymerization technique.

Keywords

oxygen permeation; water vapor permeation; plasma polymerization; XPS; IR spectra; SiOx

Key words in English

oxygen permeation; water vapor permeation; plasma polymerization; XPS; IR spectra; SiOx

Authors

INAGAKI, N.; ČECH, V.

Released

13.12.2007

ISBN

0021-8995

Periodical

JOURNAL OF APPLIED POLYMER SCIENCE

Volume

104

Number

2

State

United States of America

Pages from

915

Pages to

925

Pages count

11

Full text in the Digital Library

http://hdl.handle.net/

BibTex

@article{BUT45127,
  author="Norihiro {Inagaki} and Vladimír {Čech}",
  title="Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen",
  journal="JOURNAL OF APPLIED POLYMER SCIENCE",
  year="2007",
  volume="104",
  number="2",
  pages="915--925",
  issn="0021-8995"
}