Detail publikačního výsledku
Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas
ČECH, V.; STUDÝNKA, J.; JANOŠ, F.; PEŘINA, V.
Original Title
Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas
English Title
Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen.
English abstract
Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen.
Keywords
Glow discharge mass spectroscopy (GDMS); Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD; Plasma polymer
Key words in English
Glow discharge mass spectroscopy (GDMS); Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD; Plasma polymer
Authors
ČECH, V.; STUDÝNKA, J.; JANOŠ, F.; PEŘINA, V.
Released
13.12.2007
ISBN
1612-8850
Periodical
Plasma Processes and Polymers
Volume
4
Number
S1
State
Federal Republic of Germany
Pages from
776
Pages to
780
Pages count
5
Full text in the Digital Library
BibTex
@article{BUT45130,
author="Vladimír {Čech} and Jan {Studýnka} and Filip {Janoš} and Vratislav {Peřina}",
title="Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas",
journal="Plasma Processes and Polymers",
year="2007",
volume="4",
number="S1",
pages="776--780",
issn="1612-8850"
}