Publication result detail
Plasma polymerisation of methylphenylsilane
SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.
Original Title
Plasma polymerisation of methylphenylsilane
English Title
Plasma polymerisation of methylphenylsilane
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.
English abstract
Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.
Keywords
Polysilane; PMPS; Plasma deposition; Mass spectroscopy
Key words in English
Polysilane; PMPS; Plasma deposition; Mass spectroscopy
Authors
SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.
Released
27.09.2005
Publisher
Elsevier
Location
London
ISBN
0257-8972
Periodical
SURFACE & COATINGS TECHNOLOGY
Volume
200
Number
1-4
State
Swiss Confederation
Pages from
486
Pages to
489
Pages count
4
BibTex
@article{BUT46370,
author="Ota {Salyk} and Pavel {Broža} and Norbert {Dokoupil} and Radim {Herrmann} and Ivo {Kuřitka} and Jiří {Pryček} and Martin {Weiter}",
title="Plasma polymerisation of methylphenylsilane",
journal="SURFACE & COATINGS TECHNOLOGY",
year="2005",
volume="200",
number="1-4",
pages="486--489",
issn="0257-8972"
}