Detail publikačního výsledku

Plasma polymerisation of methylphenylsilane

SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.

Originální název

Plasma polymerisation of methylphenylsilane

Anglický název

Plasma polymerisation of methylphenylsilane

Druh

Článek recenzovaný mimo WoS a Scopus

Originální abstrakt

Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.

Anglický abstrakt

Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.

Klíčová slova

Polysilane; PMPS; Plasma deposition; Mass spectroscopy

Klíčová slova v angličtině

Polysilane; PMPS; Plasma deposition; Mass spectroscopy

Autoři

SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.

Vydáno

27.09.2005

Nakladatel

Elsevier

Místo

London

ISSN

0257-8972

Periodikum

SURFACE & COATINGS TECHNOLOGY

Svazek

200

Číslo

1-4

Stát

Švýcarská konfederace

Strany od

486

Strany do

489

Strany počet

4

BibTex

@article{BUT46370,
  author="Ota {Salyk} and Pavel {Broža} and Norbert {Dokoupil} and Radim {Herrmann} and Ivo {Kuřitka} and Jiří {Pryček} and Martin {Weiter}",
  title="Plasma polymerisation of methylphenylsilane",
  journal="SURFACE & COATINGS TECHNOLOGY",
  year="2005",
  volume="200",
  number="1-4",
  pages="486--489",
  issn="0257-8972"
}