Publication result detail
Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films
PŘIKRYL, R.; ČECH, V.; HEDBAVNY, P.; INAGAKI, N.
Original Title
Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films
English Title
Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films
Type
Abstract
Original Abstract
The aim of article is description of newly designed system for nanotechnology realised via PE-CVD technique
English abstract
The aim of article is description of newly designed system for nanotechnology realised via PE-CVD technique
Keywords
PECVD, NANO, technology
Key words in English
PECVD, NANO, technology
Authors
PŘIKRYL, R.; ČECH, V.; HEDBAVNY, P.; INAGAKI, N.
Released
12.08.2005
Publisher
Centre for Advanced coatings Technology, University of Toronto
Location
Toronto
Book
Proceedings of 17th symposium on plasma chemistry
Pages from
423
Pages to
424
Pages count
2
BibTex
@misc{BUT60241,
author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny} and Norihiro {Inagaki}",
title="Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films",
booktitle="Proceedings of 17th symposium on plasma chemistry",
year="2005",
pages="423--424",
publisher="Centre for Advanced coatings Technology, University of Toronto",
address="Toronto",
note="Abstract"
}