Publication result detail
Plasma-enhanced chemical vapor deposition of nanocomposite thin films
TRIVEDI, R.; KONTÁROVÁ, S.; ČECH, V.
Original Title
Plasma-enhanced chemical vapor deposition of nanocomposite thin films
English Title
Plasma-enhanced chemical vapor deposition of nanocomposite thin films
Type
Abstract
Original Abstract
The deposited films at a power of 10 W (self-bias 120 V) were of grain structure with a diameter of grains 20-100 nm. The diameter of some grains increased up to 0.5 micron with en-hanced power at an expense of smaller ones, whose magnitude decreased.
English abstract
The deposited films at a power of 10 W (self-bias 120 V) were of grain structure with a diameter of grains 20-100 nm. The diameter of some grains increased up to 0.5 micron with en-hanced power at an expense of smaller ones, whose magnitude decreased.
Keywords
PECVD, nanocomposite, AFM, nanoindentaion
Key words in English
PECVD, nanocomposite, AFM, nanoindentaion
Authors
TRIVEDI, R.; KONTÁROVÁ, S.; ČECH, V.
RIV year
2011
Released
27.12.2010
Book
PSE 2010
Pages from
1
Pages to
1
Pages count
1
BibTex
@misc{BUT60976,
author="Rutul Rajendra {Trivedi} and Soňa {Kontárová} and Vladimír {Čech}",
title="Plasma-enhanced chemical vapor deposition of nanocomposite thin films",
booktitle="PSE 2010",
year="2010",
edition="1",
pages="1--1",
note="Abstract"
}