Result with impact on practice detail

Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

ČECH, V.

Original Title

Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

English Title

Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

Type

Audiovisual work

Original Abstract

A Nano Indenter XP (MTS Systems) was used to perform the indentation tests with a continuous stiffness measurement (CSM) technique and the depth profiles of Young's modulus and hardness to 20% of the film thickness were evaluated. A triangular pyramid (Berkovich) diamond indenter was employed for all experiments. Each sample was subjected to three load-unload cycles.

English abstract

A Nano Indenter XP (MTS Systems) was used to perform the indentation tests with a continuous stiffness measurement (CSM) technique and the depth profiles of Young's modulus and hardness to 20% of the film thickness were evaluated. A triangular pyramid (Berkovich) diamond indenter was employed for all experiments. Each sample was subjected to three load-unload cycles.

Keywords

thin film nanoindentation

Key words in English

thin film nanoindentation

Authors

ČECH, V.

Released

28.11.2006

Location

Mittelwihr

Edition

COST P12

URL

http://www.uni-rostock.de/fakult/manafak/physik/poly/COST_P12/index.htm

Full text in the Digital Library

http://hdl.handle.net/

BibTex

@misc{BUT63473,
  author="Vladimír {Čech}",
  title="Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films",
  year="2006",
  series="COST P12",
  edition="2006",
  address="Mittelwihr",
  url="http://www.uni-rostock.de/fakult/manafak/physik/poly/COST_P12/index.htm",
  note="Audiovisual work"
}