Pulse mode in plasma polymerization of hexamethyldisiloxane

Pulse mode in plasma polymerization of hexamethyldisiloxane

Abstract

PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.

PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.

Optical emission spectroscopy, Hexamethyldisiloxane, Thin film deposition

Optical emission spectroscopy, Hexamethyldisiloxane, Thin film deposition

BLAHOVÁ, L.; PROCHÁZKA, M.; KRČMA, F.

2012

14.09.2011

Brno

Chemické Listy 105

0009-2770

CHEMICKE LISTY

105

Czech Republic

s901

s902

2