Publication result detail
Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments
KOČIŠEK, J.; STRUŽÍNSKÝ, O.; SAHÁNKOVÁ, H.; KRČMA, F.; MATEJČÍK, Š.
Original Title
Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments
English Title
Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments
Type
Peer-reviewed article not indexed in WoS or Scopus
Original Abstract
Electron ionization (EI) to dimethylphenylsilane (DMPS) is studied in crossed electron-molecular beams experiment. Using this technique with improved energy resolution of the electron beam, the positive mass spectra and the relative partial cross sections for EI to DMPS are obtained. The ionization energy of DMPS of 9.04 +- 0.06eV and the threshold energies for dissociative ionization channels are estimated. The bond dissociation energies for single bond cleavage channels are also estimated on the basis of experimental observations. The detection of doubly charged ions of DMPS2+ (AE=26.3 +- eV) as well as several other doubly charged fragments is discussed in detail.
English abstract
Electron ionization (EI) to dimethylphenylsilane (DMPS) is studied in crossed electron-molecular beams experiment. Using this technique with improved energy resolution of the electron beam, the positive mass spectra and the relative partial cross sections for EI to DMPS are obtained. The ionization energy of DMPS of 9.04 +- 0.06eV and the threshold energies for dissociative ionization channels are estimated. The bond dissociation energies for single bond cleavage channels are also estimated on the basis of experimental observations. The detection of doubly charged ions of DMPS2+ (AE=26.3 +- eV) as well as several other doubly charged fragments is discussed in detail.
Keywords
appearance energy;dimethylphenylsilane;electron ionization;organometallic vapour deposition;thin films
Key words in English
appearance energy;dimethylphenylsilane;electron ionization;organometallic vapour deposition;thin films
Authors
KOČIŠEK, J.; STRUŽÍNSKÝ, O.; SAHÁNKOVÁ, H.; KRČMA, F.; MATEJČÍK, Š.
RIV year
2013
Released
16.03.2012
ISBN
1612-8850
Periodical
Plasma Processes and Polymers
Volume
9
Number
3
State
Federal Republic of Germany
Pages from
298
Pages to
303
Pages count
6
BibTex
@article{BUT74088,
author="Jaroslav {Kočišek} and Ondřej {Stružínský} and Hana {Sahánková} and František {Krčma} and Štefan {Matejčík}",
title="Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments",
journal="Plasma Processes and Polymers",
year="2012",
volume="9",
number="3",
pages="298--303",
issn="1612-8850"
}