R&D result detail

Original Title

Thickness measurement of thin soft organic films

English Title

Thickness measurement of thin soft organic films

Type

Paper in proceedings (conference paper)

Original Abstract

This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured.

English abstract

This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured.

Keywords

This soft organic films , Interference microscopy , Semiconductor device measurement , Surface morphology , Thickness measurement

Key words in English

This soft organic films , Interference microscopy , Semiconductor device measurement , Surface morphology , Thickness measurement

Authors

MLADENOVA, D.; SIDEROV, V.; ZHIVKOV, I.; SALYK, O.; OHLÍDAL, M.; YORDANOVA, I.; YORDANOV, R.; PHILIPPOV, P.; WEITER, M.

RIV year

2014

Released

09.05.2012

Location

Bad Aussee, Austria

ISBN

978-1-4673-2241-6

Book

Electronics Technology (ISSE), 2012 35th International Spring Seminar on

Pages from

367

Pages to

372

Pages count

6

BibTex

@inproceedings{BUT99298,
  author="MLADENOVA, D. and SIDEROV, V. and ZHIVKOV, I. and SALYK, O. and OHLÍDAL, M. and YORDANOVA, I. and YORDANOV, R. and PHILIPPOV, P. and WEITER, M.",
  title="Thickness measurement of thin soft organic films",
  booktitle="Electronics Technology (ISSE), 2012 35th International Spring Seminar on",
  year="2012",
  pages="367--372",
  address="Bad Aussee, Austria",
  isbn="978-1-4673-2241-6"
}