Course detail
Physics and chemics of plasma
FCH-DCO_FNDAcad. year: 2011/2012
Thermodynamic and kinetics of plasma(nonequilibrium and equilibrium plasma,distribution functions, basic transport processes in plasma, population of electronic, vibrational and rotatiopnal states). Methods of plasma diagnostics (optical, spectral, probe and corpuscular). Plasma in labs.( ss, ac, RF, MW, plasma excited at low and high pressures, capacitively and inductively coupled plasma, dielectric properties of plasma). Application of plasma chemical processes and special kinds of plasmas with assisted chemical reactions.
Language of instruction
Mode of study
Guarantor
Learning outcomes of the course unit
Prerequisites
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations
Co-requisites
Planned learning activities and teaching methods
Assesment methods and criteria linked to learning outcomes
Course curriculum
Plasma in thermodynamic equilibrium and disequilibrium, Non-isothermic plasma.
Basic collision processes, cross sections, distribution functions.
Boltzmann kinetic equation, basic transport processes in plasma.
Inner and outer plasma parameters.
2. Elementary and chemical processes in plasmas
Electron, vibrational and rotation energy of molecules and population of the appropriate states.
Metastable states, sensibilized fluorescence and non-elastic collisions, pre-dissociation and dissociative recombination.
Mechanisms of ionization and recombination, chemiluminescence in plasma.
3. Plasma diagnostics
Spectral and optical methods, electronic, excitation, vibrational and rotational temperature.
Probe methods, floating and plasma potential, simple and double Langmuir probe.
Corpuscular methods, mass spectrometry, actinometry.
4. Laboratory plasma
Properties and generation of various laboratory plasmas (DC, AC, RF, MW discharges, corona, gliding and barrier discharges).
Plasma at high pressures (arc, plasmatron, spark, unipolar RF and MW discharges), RF discharges coupled capatively and inductively, matching networks, ECR plasma.
5. Plasma properties
Electric conductivity, diffusion and ambipolar diffusion, temperature and concentration of charged particles in various discharges; dielectric properties, permittivity, refraction index, interaction with electromagnetic field; conditions for ignition of the discharges, plasma as the spectral source (ICP).
6.-9. Plasmachemical processes
Rates of the reaction in plasmas, reaction coefficients.
Homogeneous, heterogeneous and homogeny-heterogeneous reactions. PE CVD and PA CVD methods.
Atomic oxygen reactions, creation of oxides, ozone generation, ozonizators, detection.
Atomic nitrogen reactions, Nitridation, surface nitridation, reactions in the post-discharges.
Atomic hydrogen reactions (a-Si:H), plasma etching, reactive ion etching, ion melting.
Plasma polymerization.
Surface hydrophilization and hydrophobization of various materials (polymers, textile, glass, semiconductors).
Grafting, increase of adhesivity and wettability, reactions of aliphatic and aromatic hydrocarbons in plasmas.
Siloxane and silazane reactions, protective coatings, semipermeabile membranes and selective sorption layers.
Magnetron (reactive) sputtering, hard and ultra hard coatings prepared by plasmachemical processes (diamond like layers, a-C:H, microcrystaline diamond thin layers, c-BN, TiN, AlN and nanocrystaline composites).
Plasma spraying, nanocrystalic powder materials, fullerenes, nanotubes.
10. Special kinds of plasma with participation of the chemical reactions
Chemical lasers, pulsed lasers, photodissociative lasers (ASTERIX), flat plasma displays.
Plasma created in the gas mixtures and amalgam vapors, Penning mixtures, plasma in the illumination technique.
Work placements
Aims
Specification of controlled education, way of implementation and compensation for absences
Recommended optional programme components
Prerequisites and corequisites
Basic literature
ROTH J.R. Industrial Plasma Engineering I. , II., London: CRC Press - Taylor & Francis Group, 1995, ISBN (Vol. 1): 978-0750303187, ISBN (Vol. 2): 978-0750303170 (CS)
SHUL, R.J., PEARTON, S.J. Handbook of Advanced Plasma Processing, 1st ed., Berlin: Springer, 2000, ISBN 978-3-642-56989-0 (CS)
Recommended reading
Classification of course in study plans
- Programme DKCP_FCH Doctoral
branch DKCPO_FCH , 1 year of study, winter semester, compulsory-optional
- Programme DKCP_FCH_4 Doctoral
branch DKCPO_FCH_4 , 1 year of study, winter semester, compulsory-optional
- Programme DPCP_FCH_4 Doctoral
branch DPCPO_FCH_4 , 1 year of study, winter semester, compulsory-optional
- Programme DPCP_FCH Doctoral
branch DPCO_FCH , 1 year of study, winter semester, compulsory-optional
- Programme CKCP_CZV lifelong learning
branch CKCO_CZV , 1 year of study, winter semester, compulsory-optional
Type of course unit
Guided consultation in combined form of studies
Teacher / Lecturer