Course detail


FCH-DCO_NADAcad. year: 2023/2024

Sources of photochemically acive radiation, radiant flux measurement, Negative photoresists: photochemical processes by photoinduced crosslinking, Physical chemistry of crosslinking, Gel-point and resist sensitivity. Quantum yield of crosslinking. Photoinitiated polymerization. Radical generation, photofragmentation, hydrogen abstraction, photoinitiated cationic polymerization. Positive photoresists, photochemical transformation of diazonaphtochinons. Positive photoresists for UV-B region. Photoresist sensitometry.

Language of instruction


Number of ECTS credits


Mode of study

Not applicable.

Entry knowledge

Photochemistry, physical chemistry

Rules for evaluation and completion of the course

Oral exam


The aim of this course is to provide students with advanced photochemical technologies.
Advanced knowledge of photochemistry and photophysics, photochemical reactions of organic and macromolecular compounds, polymer imaging systems and photopolymerizable systems and their use.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

REISER, A. Photoreactive Polymers: The Science and Technology of Resists. (EN)
ŠÍMA, J., ČEPPAN, M., JANČOVIČOVÁ, V., VELIČ, D. Fotochémia. 1. vyd. STU Bratislava, 2011 (SK)

Recommended reading

LAPČÍK, L., PELIKÁN P., ČEPPAN, M. Fotochemické procesy. 1. vyd. Alfa Bratislava, 1987 (SK)


Classification of course in study plans

  • Programme Akred Doctoral, 1. year of study, winter semester, compulsory-optional

  • Programme DPCP_FCH_4 Doctoral

    branch DPCPO_FCH_4 , 1. year of study, winter semester, compulsory-optional

  • Programme DKCP_FCH_4 Doctoral

    branch DKCPO_FCH_4 , 1. year of study, winter semester, compulsory-optional

Type of course unit



26 hours, optionally

Teacher / Lecturer