Detail publikačního výsledku
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.
Originální název
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
Anglický název
PECVD Characterization During the Deposition of Thin Fluorocarbon Films
Druh
Abstrakt
Originální abstrakt
This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.
Anglický abstrakt
This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.
Klíčová slova
PECVD, fluorocarbon thin films, plasma diagnostics
Klíčová slova v angličtině
PECVD, fluorocarbon thin films, plasma diagnostics
Autoři
BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.
Rok RIV
2014
Vydáno
28.04.2013
Nakladatel
Eindhoven University
Místo
Eindhoven
Kniha
10th Frontiers in Low Temperature Plasma Diagnostics – Book of Abstracts
Strany od
P1-2
Strany do
P1-2
Strany počet
1