Detail publikačního výsledku

Processes of gelation in the system SiO2-H2O.

Fasurová, N.

Originální název

Processes of gelation in the system SiO2-H2O.

Anglický název

Processes of gelation in the system SiO2-H2O.

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

The work was focused on determination of parameters of gelation process in SiO2-H2O System with additives on the base calcium or natrium chloride, sulphate, citrate and acetate. Electrokinetic measurements involved monitoring surface charge development was used. The basic material was a sol of silicon dioxide (Tosil, Silchem). Values of the zeta potential were calculated from Helmholtz-Smoluchowski relation. Were determined isoelectric points of the systems of SiO2 in the presence of salts.

Anglický abstrakt

The work was focused on determination of parameters of gelation process in SiO2-H2O System with additives on the base calcium or natrium chloride, sulphate, citrate and acetate. Electrokinetic measurements involved monitoring surface charge development was used. The basic material was a sol of silicon dioxide (Tosil, Silchem). Values of the zeta potential were calculated from Helmholtz-Smoluchowski relation. Were determined isoelectric points of the systems of SiO2 in the presence of salts.

Klíčová slova

sol SiO2, zeta potential, isoelectric point

Klíčová slova v angličtině

sol SiO2, zeta potential, isoelectric point

Autoři

Fasurová, N.

Vydáno

09.09.1999

Nakladatel

VUT fakulta chemická

Místo

Brno

ISBN

80-214-1371-9

Kniha

Proceedings of 1st Meeting on Chemistry and Life

Edice

1

Strany od

167

Strany do

168

Strany počet

2

BibTex

@inproceedings{BUT12216,
  author="Naděžda {Fasurová}",
  title="Processes of gelation in the system SiO2-H2O.",
  booktitle="Proceedings of 1st Meeting on Chemistry and Life",
  year="1999",
  series="1",
  number="1",
  pages="167--168",
  publisher="VUT fakulta chemická",
  address="Brno",
  isbn="80-214-1371-9"
}