Detail publikačního výsledku

Chemical properties of plasma-polymerized vinyltriethoxysilane

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

Originální název

Chemical properties of plasma-polymerized vinyltriethoxysilane

Anglický název

Chemical properties of plasma-polymerized vinyltriethoxysilane

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition. Deposited films were characterized by spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their elemental composition and chemical structure. We were able to influence/control the elemental composition and chemical structure of the plasma polymer films in relatively wide ranges by increasing the effective power.

Anglický abstrakt

Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition. Deposited films were characterized by spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their elemental composition and chemical structure. We were able to influence/control the elemental composition and chemical structure of the plasma polymer films in relatively wide ranges by increasing the effective power.

Klíčová slova

PE CVD; thin film; organosilicon; FTIR; RBS; ERDA; XPS

Klíčová slova v angličtině

PE CVD; thin film; organosilicon; FTIR; RBS; ERDA; XPS

Autoři

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

Vydáno

01.08.2005

Nakladatel

Conference Management, Toronto

Místo

Toronto, Kanada

Kniha

Proc. 17th International Symposium on Plasma Chemistry

Strany od

1

Strany do

5

Strany počet

5

Plný text v Digitální knihovně

http://hdl.handle.net/

BibTex

@inproceedings{BUT16049,
  author="Vladimír {Čech} and Jan {Vaněk} and Vratislav {Peřina} and Josef {Zemek}",
  title="Chemical properties of plasma-polymerized vinyltriethoxysilane",
  booktitle="Proc. 17th International Symposium on Plasma Chemistry",
  year="2005",
  pages="1--5",
  publisher="Conference Management, Toronto",
  address="Toronto, Kanada"
}