Detail publikace

Chemical properties of plasma-polymerized vinyltriethoxysilane

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition. Deposited films were characterized by spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their elemental composition and chemical structure. We were able to influence/control the elemental composition and chemical structure of the plasma polymer films in relatively wide ranges by increasing the effective power.

Klíčová slova

PE CVD; thin film; organosilicon; FTIR; RBS; ERDA; XPS

Autoři

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

Rok RIV

2005

Vydáno

1. 8. 2005

Nakladatel

Conference Management, Toronto

Místo

Toronto, Kanada

Strany od

Strany do

Strany počet

BibTex

@inproceedings{BUT16049,
  author="Vladimír {Čech} and Jan {Vaněk} and Vratislav {Peřina} and Josef {Zemek}",
  title="Chemical properties of plasma-polymerized vinyltriethoxysilane",
  booktitle="Proc. 17th International Symposium on Plasma Chemistry",
  year="2005",
  pages="1--5",
  publisher="Conference Management, Toronto",
  address="Toronto, Kanada"
}