Detail publikačního výsledku
Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
NARIMISA, M.; KRČMA, F.; ONYSHCHENKO, Y.; KOZÁKOVÁ, Z.; MORENT, R.; DE GEYTER, N.
Originální název
Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
Anglický název
Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
Druh
Článek WoS
Originální abstrakt
In this work, the potential of a microwave (MW)‐induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non‐uniform monomer distribution near the substrate and the dependency of the deposition area on the monomercontaining gas flow rate. A non‐homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.
Anglický abstrakt
In this work, the potential of a microwave (MW)‐induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non‐uniform monomer distribution near the substrate and the dependency of the deposition area on the monomercontaining gas flow rate. A non‐homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.
Klíčová slova
atmospheric pressure plasma jet (APPJ); microwave (MW) discharge; thin film deposition; optical emission spectroscopy (OES); Comsol MultiPhysics; methyl methacrylate (MMA); styrene
Klíčová slova v angličtině
atmospheric pressure plasma jet (APPJ); microwave (MW) discharge; thin film deposition; optical emission spectroscopy (OES); Comsol MultiPhysics; methyl methacrylate (MMA); styrene
Autoři
NARIMISA, M.; KRČMA, F.; ONYSHCHENKO, Y.; KOZÁKOVÁ, Z.; MORENT, R.; DE GEYTER, N.
Rok RIV
2021
Vydáno
06.02.2020
Nakladatel
MDPI
Místo
Basel
ISSN
2073-4360
Periodikum
Polymers
Svazek
12
Číslo
2
Stát
Švýcarská konfederace
Strany od
1
Strany do
23
Strany počet
23
URL
Plný text v Digitální knihovně
BibTex
@article{BUT165976,
author="Mehrnoush {Narimisa} and František {Krčma} and Yuliia {Onyshchenko} and Zdenka {Kozáková} and Rino {Morent} and Nathalie {De Geyter}",
title="Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
",
journal="Polymers",
year="2020",
volume="12",
number="2",
pages="1--23",
doi="10.3390/polym12020354",
url="https://www.mdpi.com/2073-4360/12/2/354"
}Dokumenty