Detail publikačního výsledku

Combined Analysis of an Rf Plasma Source

MĚŠŤÁNKOVÁ, Z.; JUŘÍK, K.; MRÓZEK, K.; OBRUSNÍK, A.; KRČMA, F.; DREXLER, P.

Originální název

Combined Analysis of an Rf Plasma Source

Anglický název

Combined Analysis of an Rf Plasma Source

Druh

Abstrakt

Originální abstrakt

This work presents an analysis of a radiofrequency-driven low-pressure argon plasma source. The source is analysed by measuring extracted ion, electron current and by optical emission spectroscopy (OES). The results are compared with respect to the variations in operating conditions of the source. While the extracted current shows us the general view of the optimal operating conditions, the optical emission spectroscopy reveals the relative distribution of excited states. This combination, together with a wide set of input parameters (such as the set radiofrequency power, magnetic field strength or background pressure) overcomes the relative nature of the OES results. Although we are still not able to conclusively model the whole distribution of the excited states of argon (and electron temperature), we successfully coupled the changes in the ratio of selected Ar emission lines to the general performance of the plasma source and to the variation of the input parameters.

Anglický abstrakt

This work presents an analysis of a radiofrequency-driven low-pressure argon plasma source. The source is analysed by measuring extracted ion, electron current and by optical emission spectroscopy (OES). The results are compared with respect to the variations in operating conditions of the source. While the extracted current shows us the general view of the optimal operating conditions, the optical emission spectroscopy reveals the relative distribution of excited states. This combination, together with a wide set of input parameters (such as the set radiofrequency power, magnetic field strength or background pressure) overcomes the relative nature of the OES results. Although we are still not able to conclusively model the whole distribution of the excited states of argon (and electron temperature), we successfully coupled the changes in the ratio of selected Ar emission lines to the general performance of the plasma source and to the variation of the input parameters.

Autoři

MĚŠŤÁNKOVÁ, Z.; JUŘÍK, K.; MRÓZEK, K.; OBRUSNÍK, A.; KRČMA, F.; DREXLER, P.

Vydáno

30.11.2023

Nakladatel

Vysoké učení technické v Brně, Fakulta chemická

Místo

Brno

ISBN

978-80-214-6204-5

Kniha

Studentská odborná konference Chemie je život 2023 Sborník abstraktů

Strany od

87

Strany do

87

Strany počet

1

URL

https://www.fch.vut.cz/vav/konference/sok/vystupy/sbornik-abstraktu-2023-na-web-pdf-p251584

BibTex

@misc{BUT198808,
  author="Zuzana {Měšťánková} and Karel {Juřík} and Kryštof {Mrózek} and Adam {Obrusník} and František {Krčma} and Petr {Drexler}",
  title="Combined Analysis of an Rf Plasma Source",
  booktitle="Studentská odborná konference Chemie je život 2023 Sborník abstraktů",
  year="2023",
  pages="87--87",
  publisher="Vysoké učení technické v Brně, Fakulta chemická",
  address="Brno",
  isbn="978-80-214-6204-5",
  url="https://www.fch.vut.cz/vav/konference/sok/vystupy/sbornik-abstraktu-2023-na-web-pdf-p251584",
  note="Abstract"
}