Detail publikačního výsledku

CN Chemiluminiscence in N2+CH4 Flowing Afterglow at Low Temperatures

JANČA, J., TÁLSKÝ, A., KRČMA, F., HOCHARD, L., RICARD, A.

Originální název

CN Chemiluminiscence in N2+CH4 Flowing Afterglow at Low Temperatures

Anglický název

CN Chemiluminiscence in N2+CH4 Flowing Afterglow at Low Temperatures

Druh

Článek recenzovaný mimo WoS a Scopus

Originální abstrakt

The nitrogen recombination has been studied in the flowing microwave system at a wall temperature of 77 K. The strong CN chemiluminiscence has been observed if methane traces has been added. A brief kinetic model of the processes during the afterglow is given, too.

Anglický abstrakt

The nitrogen recombination has been studied in the flowing microwave system at a wall temperature of 77 K. The strong CN chemiluminiscence has been observed if methane traces has been added. A brief kinetic model of the processes during the afterglow is given, too.

Klíčová slova

Nitrogen afterglow, CN chemiluminiscence, kinetic processes

Klíčová slova v angličtině

Nitrogen afterglow, CN chemiluminiscence, kinetic processes

Autoři

JANČA, J., TÁLSKÝ, A., KRČMA, F., HOCHARD, L., RICARD, A.

Vydáno

01.01.1994

ISSN

0272-4324

Periodikum

Plasma chemistry and plasma processing

Svazek

14

Stát

Spojené státy americké

Strany od

197

Strany počet

12

BibTex

@article{BUT39853,
  author="Jan {Janča} and Antonín {Tálský} and František {Krčma} and Luce {Hochard} and André {Ricard}",
  title="CN Chemiluminiscence in N2+CH4 Flowing Afterglow at Low Temperatures",
  journal="Plasma chemistry and plasma processing",
  year="1994",
  volume="14",
  pages="12",
  issn="0272-4324"
}