Detail publikačního výsledku

Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

INAGAKI, N.; ČECH, V.

Originální název

Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

Anglický název

Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

Druh

Článek recenzovaný mimo WoS a Scopus

Originální abstrakt

SiOx films were deposited from a mixture of tetramethoxysilane (TMOS) and oxygen on poly(ethylene 2,6-naphtalene) film using ion-assisted plasma polymerization technique and conventional plasma polymerization technique.

Anglický abstrakt

SiOx films were deposited from a mixture of tetramethoxysilane (TMOS) and oxygen on poly(ethylene 2,6-naphtalene) film using ion-assisted plasma polymerization technique and conventional plasma polymerization technique.

Klíčová slova

oxygen permeation; water vapor permeation; plasma polymerization; XPS; IR spectra; SiOx

Klíčová slova v angličtině

oxygen permeation; water vapor permeation; plasma polymerization; XPS; IR spectra; SiOx

Autoři

INAGAKI, N.; ČECH, V.

Vydáno

13.12.2007

ISSN

0021-8995

Periodikum

JOURNAL OF APPLIED POLYMER SCIENCE

Svazek

104

Číslo

2

Stát

Spojené státy americké

Strany od

915

Strany do

925

Strany počet

11

BibTex

@article{BUT45127,
  author="Norihiro {Inagaki} and Vladimír {Čech}",
  title="Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen",
  journal="JOURNAL OF APPLIED POLYMER SCIENCE",
  year="2007",
  volume="104",
  number="2",
  pages="915--925",
  issn="0021-8995"
}