Detail publikačního výsledku

Spectroscopic ellipsometry study of plasma-polymerised vinyltriethoxysilane films

MISTRÍK, J.; ČECHALOVÁ, B.; STUDÝNKA, J.; ČECH, V.

Originální název

Spectroscopic ellipsometry study of plasma-polymerised vinyltriethoxysilane films

Anglický název

Spectroscopic ellipsometry study of plasma-polymerised vinyltriethoxysilane films

Druh

Článek recenzovaný mimo WoS a Scopus

Originální abstrakt

Plasma-polymerised vinyltriethoxysilane (pp-VTES) films with thicknesses ranging from 20 nm to about 5 micron were studied by combined method of spectroscopic ellipsometry and optical reflectivity in VIS and UV spectral zone. For these photon energies Tauc-Lorentz dielectric function (with a band gap of about 2.5 eV) was found to be an appropriate parameterisation of pp-VTES optical constants. Various sample models, accounting for the presence of film interfaces, film refractive index gradient profile and film thickness non uniformity were considered. Pp-VTES films (t < 1 m) can be considered as homogeneous films, whereas thick films show imperfections, which dominant character was assigned to film thickness non uniformity.

Anglický abstrakt

Plasma-polymerised vinyltriethoxysilane (pp-VTES) films with thicknesses ranging from 20 nm to about 5 micron were studied by combined method of spectroscopic ellipsometry and optical reflectivity in VIS and UV spectral zone. For these photon energies Tauc-Lorentz dielectric function (with a band gap of about 2.5 eV) was found to be an appropriate parameterisation of pp-VTES optical constants. Various sample models, accounting for the presence of film interfaces, film refractive index gradient profile and film thickness non uniformity were considered. Pp-VTES films (t < 1 m) can be considered as homogeneous films, whereas thick films show imperfections, which dominant character was assigned to film thickness non uniformity.

Klíčová slova

thin film; plasma polymerization; ellipsometry

Klíčová slova v angličtině

thin film; plasma polymerization; ellipsometry

Autoři

MISTRÍK, J.; ČECHALOVÁ, B.; STUDÝNKA, J.; ČECH, V.

Rok RIV

2010

Vydáno

22.12.2009

ISSN

0957-4522

Periodikum

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Svazek

20

Číslo

1

Stát

Nizozemsko

Strany od

S451

Strany do

S455

Strany počet

5