Detail publikačního výsledku
Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.
Originální název
Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
Anglický název
Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
Druh
Článek recenzovaný mimo WoS a Scopus
Originální abstrakt
Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.
Anglický abstrakt
Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.
Klíčová slova
Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization
Klíčová slova v angličtině
Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization
Autoři
ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.
Rok RIV
2010
Vydáno
22.12.2008
ISSN
0257-8972
Periodikum
SURFACE & COATINGS TECHNOLOGY
Svazek
202
Číslo
22
Stát
Švýcarská konfederace
Strany od
5572
Strany do
5575
Strany počet
4
BibTex
@article{BUT48292,
author="Vladimír {Čech} and Jan {Studýnka} and Božena {Čechalová} and Jan {Mistrík} and Josef {Zemek}",
title="Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD",
journal="SURFACE & COATINGS TECHNOLOGY",
year="2008",
volume="202",
number="22",
pages="5572--5575",
issn="0257-8972"
}