Detail publikačního výsledku

Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane

ČECH, V.; GORUPPA, A.; VANĚK, J.; JONES, F.

Originální název

Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane

Anglický název

Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

Plasma-polymerized thin films of vinyltriethoxysilane have been prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling pulsed-plasma system. Thin films of the thickness ranging from 80 nm to 1.5 um were subjected to nanoindentation measurements. The Youngs modulus determined from the indentation load-displacement curve has increased with the effective power used from 4 GPa to 11 GPa. Thin films have exhibited an abrupt increase of the hardness at the film surface.

Anglický abstrakt

Plasma-polymerized thin films of vinyltriethoxysilane have been prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling pulsed-plasma system. Thin films of the thickness ranging from 80 nm to 1.5 um were subjected to nanoindentation measurements. The Youngs modulus determined from the indentation load-displacement curve has increased with the effective power used from 4 GPa to 11 GPa. Thin films have exhibited an abrupt increase of the hardness at the film surface.

Klíčová slova v angličtině

VTEO, pulsed plasma, vinyltriethoxysilane, Young modulus

Autoři

ČECH, V.; GORUPPA, A.; VANĚK, J.; JONES, F.

Vydáno

01.01.2003

Nakladatel

Department of chemistry, University of Bari

Místo

Bari

Kniha

16th International Symposium on Plasma Chemistry

Strany od

461

Strany počet

6

Plný text v Digitální knihovně

http://hdl.handle.net/

BibTex

@inproceedings{BUT8362,
  author="Vladimír {Čech} and Alexander {Goruppa} and Jan {Vaněk} and Frank {Jones}",
  title="Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane",
  booktitle="16th International Symposium on Plasma Chemistry",
  year="2003",
  pages="6",
  publisher="Department of chemistry, University of Bari",
  address="Bari"
}