Detail publikačního výsledku

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

Anglický název

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Anglický abstrakt

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Klíčová slova

Plasma thin layer deposition, organosilicone films, optical emission spectroscopy

Klíčová slova v angličtině

Plasma thin layer deposition, organosilicone films, optical emission spectroscopy

Autoři

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Vydáno

25.06.2003

Nakladatel

IUPAC

Místo

Taormina

Kniha

Proceedings of ISPC XVI

Strany od

1

Strany počet

6

Plný text v Digitální knihovně

http://hdl.handle.net/

BibTex

@inproceedings{BUT8829,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films",
  booktitle="Proceedings of ISPC XVI",
  year="2003",
  number="1",
  pages="6",
  publisher="IUPAC",
  address="Taormina"
}