Detail publikačního výsledku
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.
Originální název
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
Anglický název
In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy
Druh
Stať ve sborníku v databázi WoS či Scopus
Originální abstrakt
Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
Anglický abstrakt
Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
Klíčová slova
PECVD, HMDSO, thin layers, barriere properties
Klíčová slova v angličtině
PECVD, HMDSO, thin layers, barriere properties
Autoři
PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.
Rok RIV
2013
Vydáno
10.07.2012
Nakladatel
EPS
Místo
Lisbon
ISBN
2-914771-74-6
Kniha
Europhysics Conference Abstracts
Strany od
P3.5.71
Strany do
P3.5.72
Strany počet
2
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