Detail publikačního výsledku

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

ČECH, V.

Originální název

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

Anglický název

Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

Druh

Stať ve sborníku v databázi WoS či Scopus

Originální abstrakt

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Anglický abstrakt

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Klíčová slova

thin films, PECVD, fiber-reinforced composites

Klíčová slova v angličtině

thin films, PECVD, fiber-reinforced composites

Autoři

ČECH, V.

Vydáno

17.12.2012

Kniha

Proceedings 7th Asia-Pacific Int. Symp. Basics Appl. Plasma Technology (APSPT-7)

Strany od

1

Strany do

4

Strany počet

4

BibTex

@inproceedings{BUT97134,
  author="Vladimír {Čech}",
  title="Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys",
  booktitle="Proceedings 7th Asia-Pacific Int. Symp. Basics Appl. Plasma Technology (APSPT-7)",
  year="2012",
  pages="1--4"
}