Detail publikace

Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment

ČECH, V.

Originální název

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

This study, monomers of hexamethyldisilazane (HMDSZ) and vinyltrimethylsilane (VTMS) were respectively used to deposit on the surface of polyethylene terephthalate (PET) substrate by plasma enhanced chemical vapor deposition. Oxygen plasma treatment follows the HMDSZ and VTMS deposition to produce a hydrophilic surface film on the deposited surface. Time for HMDSZ and VTMS plasma deposition was changed to investigate its influences on water contact angle, deposited film thickness, refractive index, and friction coefficient properties. The surface morphologies of the processed samples were observed by scanning electron microscope and their chemical compositions were measured by X-ray photoelectron spectroscopy. At 550 nm wavelength, the optical transmittance of PET after the HMDSZ treatment decreases from 89% to 83%, but increases from 89% to 95% for the VTMS treatment. With increase in HMDSZ and VTMS deposition times, the film thickness increases and the refractive index decreases. Result revealed by XPS, SiO2 film is formed on the sample surface after the O2 plasma treatment. The film adhesion capability by the HMDSZ+O2 and VTMS+O2 treatment was stronger than that by the HMDSZ and VTMS treatment only. The SiOx films produced by HMDSZ+O2 and VTMS+O2 treatment can increase the film hardness and improve light transmittance.

Klíčová slova

HMDSZ; VTMS; Plasma deposition; Refractive index; Transmittance

Autoři

ČECH, V.

Vydáno

1. 3. 2017

ISSN

0254-0584

Periodikum

MATERIALS CHEMISTRY AND PHYSICS

Ročník

189

Číslo

1 March 2017

Stát

Švýcarská konfederace

Strany od

183

Strany do

190

Strany počet

BibTex

@article{BUT144150,
  author="Vladimír {Čech}",
  title="Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment",
  journal="MATERIALS CHEMISTRY AND PHYSICS",
  year="2017",
  volume="189",
  number="1 March 2017",
  pages="183--190",
  doi="10.1016/j.matchemphys.2016.12.057",
  issn="0254-0584"
}